Kim Jac | Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U
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概要
- KIM Jae Jeongの詳細を見る
- 同名の論文著者
- Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National Uの論文著者
関連著者
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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Kim Jac
Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Park J
Yonsei Univ. Seoul Kor
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Byun J
Process Team R&d Division Lg Semicon.co.ltd.
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Park Jaehyuk
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Byun Jeong
Ulsi Laboratory Of Lg Semicon Co. Ltd.
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Sohn D
Strategic Marheting. Applied Materials Korea
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Sohn Dong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Sohn Dong
R&d Division Lg Semicon. Co. Ltd.
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Lee Byung
Process Development Department 3 Memory R&d Division Hyundai Electronics Co. Ltd.
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Sohn D
Applied Materials Korea Chungnam Kor
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PARK Jin
ULSI Laboratory of LG Semicon Co., Ltd.
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KIM Jae
ULSI Laboratory of LG Semicon Co., Ltd.
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PARK Ji-Soo
Process Development Department 3, Memory R&D Division, Hyundai Electronics Co. Ltd.
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Byun Jeong
Process Team, R&D Division, LG Semicon.Co.Ltd.,
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Byun Jeong
Process Team R&d Division Lg Semicon.co.ltd.
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PARK Jin
Process Team, Hyundai MicroElectronics Co., Ltd.
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KIM Jun
ULSI Laboratory of LG Semicon Co., Ltd.
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Sohn Dong
Process Team, R&D Division, LG Semicon.Co.Ltd.,
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Kim Jae
Process Team, R&D Division, LG Semicon.Co.Ltd.,
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Kim J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Park Jin
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Kim Yeong-Cheol
Department of Materials Engineering, Korea University of Technology and Education
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Kim J
Seoul National Univ. Seoul Kor
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Han Chang
Memory R&d Division Hyundai Electronics Industries Co.
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Kim Yeong-cheol
Department Of Materials Engineering Korea University Of Technology And Education
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Kim Yeong-cheol
Departmnent Of Materials Engineering Korea University Of Technology And Education
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BAR Jong-Uk
Inter-university Semiconductor Research Center (ISRC), Seoul National University
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SOHN Dong
Strategic Marheting. Applied Materials Korea
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PARK Ji-Soo
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
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KIM Jae
Microprocessing Research Lab. School of Chemical Engineering, College of Engineering, Seoul National
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Kim Jac
Process Team, R&D Division, LG Semicon.Co.Ltd.,
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SOHN Dong-Kyun
Process Gr., Adv. Tech. Lab., LG Semicon. Co. Ltd.
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LEE Byung
ULSI Laboratory of LG Semicon Co. Ltd.
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KIM Eui
ULSI Laboratory of LG Semicon Co. Ltd.
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HWANG Hyunsang
ULSI Laboratory of LG Semicon Co. Ltd.
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Bae Jong-uk
Inter-university Semiconductor Research Center (isrc) Seoul National University
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Park Ji-soo
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Hwang Hyunsang
Ulsi Laboratory Lg Semicon Co.
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Kim Yeong-cheol
Department Of Energy Materials Chemical Engineering Korea University Of Technology And Education
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HAN Chang
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
著作論文
- A Study on Therlnal Stability of CoSi_2 Elnploying Novel Flne-Gralned PolycryStalline Silicon/CoSi_2/Si (001) System : Semiconductors
- W as a Bit Line Interconnection in Capacitor-Over-Bit-line (COB) Structured Dynamic Random Access Memory (DRAM) and Feasible Diffusion Barrier Layer
- Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
- Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
- Formation of Low-Resistivity Gate Electrode Suitable for the Future Devices Using Clustered DCS-Wsix Polycide
- Structural Evaluation of CVD WSix and Its Effect on Polycide Line Resistance
- W as a BIT Line Interconnection in COB Structured DRAM and Feasible Diffusion Barrier Layer