Kim Yeong-cheol | Department Of Materials Engineering Korea University Of Technology And Education
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概要
関連著者
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Kim Yeong-Cheol
Department of Materials Engineering, Korea University of Technology and Education
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Kim Yeong-cheol
Department Of Materials Engineering Korea University Of Technology And Education
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Kim Yeong-cheol
Department Of Energy Materials Chemical Engineering Korea University Of Technology And Education
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Park Jin
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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ROH Jae
Memory Research and Development Division, HYUNDAI Electronics Industries Co., Ltd.
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Baek Seung-bin
Department Of Materials Engineering Korea University Of Technology And Education
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Lee J
Department Of Electronic Engineering National Chiao Tung University
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Kim Dae-hee
Department Of Materials Engineering Korea University Of Technology And Education
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Yoo Yong-min
Department Of Materials Engineering Korea University Of Technology And Education
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Park Jin-won
Giga Process Team Lg Semicon Co. Ltd.
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Park J
Yonsei Univ. Seoul Kor
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Han Chang
Memory R&d Division Hyundai Electronics Industries Co.
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Kim Yeong-cheol
Departmnent Of Materials Engineering Korea University Of Technology And Education
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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Kim J
Changwon National Univ. Kyungnam Kor
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Lee W‐j
Sejong Univ. Seoul Kor
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Sohn D
Strategic Marheting. Applied Materials Korea
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Sohn Dong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Sohn Dong
R&d Division Lg Semicon. Co. Ltd.
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Lee Joo
Memory R&d Division Hyundai Electronics Industries Co.
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BAR Jong-Uk
Inter-university Semiconductor Research Center (ISRC), Seoul National University
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SOHN Dong
Strategic Marheting. Applied Materials Korea
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PARK Ji-Soo
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
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KIM Jae
Microprocessing Research Lab. School of Chemical Engineering, College of Engineering, Seoul National
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Park Jaehyuk
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Roh Jae
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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KIM Byoung
Memory R&D Division, Hyundai Electronics Industries, Co., Ltd.
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HAN Sang
Memory R&D Division, Hyundai Electronics Industries, Co., Ltd.
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LEE Won-Jun
Memory R&D Division, Hyundai Electronics Industries, Co., Ltd.
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KIM Jun
Memory R&D Division, Hyundai Electronics Industries, Co., Ltd.
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PARK Jin-Won
Memory R&D Division, Hyundai Electronics Industries, Co., Ltd.
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Kim Jac
Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U
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Roh Jae
Memory R & D Division Hynix Semiconductor Inc.
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Lee W‐j
Department Of Advanced Materials Engineering Sejong University
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Kim Jun
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Bae Jong-uk
Inter-university Semiconductor Research Center (isrc) Seoul National University
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Kim Byoung
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Lee Joo
Memory R&d Division Hynix Semiconductor Inc.
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Kim Jong
Institute Of Basic Science Changwon National University
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Sohn D
Applied Materials Korea Chungnam Kor
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Han Suk
Flat Panel Display Laboratory Orion Electric Company
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Park Ji-soo
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Park Jin-won
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Baek Seung-bin
Department Of Energy Materials Chemical Engineering Korea University Of Technology And Education
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Kim Dae-hee
Department Of Energy Materials Chemical Engineering Korea University Of Technology And Education
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HAN Chang
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
著作論文
- A Study on Therlnal Stability of CoSi_2 Elnploying Novel Flne-Gralned PolycryStalline Silicon/CoSi_2/Si (001) System : Semiconductors
- Interaction of bis-diethylaminosilane with a hydroxylized Si (001) surface for SiO_2 thin-film growth using density functional theory(Session 7A : Gate Oxides)
- Study of Bump Formation in Integrated Chemical Vapor Deposition-Physical Vapor Deposition Aluminum Filling Process