Bae Jong-uk | Inter-university Semiconductor Research Center (isrc) Seoul National University
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概要
関連著者
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Park J
Yonsei Univ. Seoul Kor
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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Sohn D
Strategic Marheting. Applied Materials Korea
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Sohn Dong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Sohn Dong
R&d Division Lg Semicon. Co. Ltd.
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Park Jaehyuk
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Bae Jong-uk
Inter-university Semiconductor Research Center (isrc) Seoul National University
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Sohn D
Applied Materials Korea Chungnam Kor
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Han Chang
Memory R&d Division Hyundai Electronics Industries Co.
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SOHN Dong
R&D Division, LG Semicon. Co., Ltd.
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PARK Jin
R&D Division, LG Semicon. Co., Ltd.
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PARK Ji-Soo
R&D Division, Hyundai Micro Electronics Co., Ltd.
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BAE Jong-Uk
R&D Division, Hyundai Micro Electronics Co., Ltd.
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Park Jin
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Kim Yeong-Cheol
Department of Materials Engineering, Korea University of Technology and Education
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Kim Yeong-cheol
Department Of Materials Engineering Korea University Of Technology And Education
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Kim Yeong-cheol
Departmnent Of Materials Engineering Korea University Of Technology And Education
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Oh Jong
R&d Division Hyundai Micro Electronics Co. Ltd.
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Lee Byung
Process Development Department 3 Memory R&d Division Hyundai Electronics Co. Ltd.
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BAR Jong-Uk
Inter-university Semiconductor Research Center (ISRC), Seoul National University
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SOHN Dong
Strategic Marheting. Applied Materials Korea
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PARK Ji-Soo
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
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KIM Jae
Microprocessing Research Lab. School of Chemical Engineering, College of Engineering, Seoul National
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PARK Jin
Process Team, Hyundai MicroElectronics Co., Ltd.
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HAN Chang
Process Development Department 3, Memory R&D Division, Hyundai Electronics Co. Ltd.
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SOHN Dong
Electronics and Telecommunications Research Laboratory
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PARK Ji-Soo
Process Development Department 3, Memory R&D Division, Hyundai Electronics Co. Ltd.
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BAE Jong-Uk
Process Development Department 3, Memory R&D Division, Hyundai Electronics Co. Ltd.
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OH Jong
R&D Division, Hyundai Micro Electronics Co., Ltd.
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HAN Chang
R&D Division, Hyundai Micro Electronics Co., Ltd.
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Kim Jac
Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U
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Park Ji-soo
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Kim Yeong-cheol
Department Of Energy Materials Chemical Engineering Korea University Of Technology And Education
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Shon Dong
R&D Division, Hyundai Micro Electronics Co., Ltd.
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HAN Chang
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
著作論文
- A Study on Therlnal Stability of CoSi_2 Elnploying Novel Flne-Gralned PolycryStalline Silicon/CoSi_2/Si (001) System : Semiconductors
- Improvement of Gate Oxide Reliability for Direct Tungsten-Gate Using Denudation of WN_x
- Improvement of Reverse Leakage Current by Fluorine Implantation in n^+/p Shallow Junctions Diffused from a Cobalt Silicide Layer
- Suppression of Arsenic Loss by Phosphorus Co-Implantation in n^+/p Shallow Junction Diffused from a CoSi_2 Layer