SOHN Dong-Kyun | Process Gr., Adv. Tech. Lab., LG Semicon. Co. Ltd.

スポンサーリンク

概要

• 同名の論文著者
• Process Gr., Adv. Tech. Lab., LG Semicon. Co. Ltd.の論文著者

関連著者

• Park J

  Memory R&d Center Hyundai Electronics Industries Co. Ltd.

• Park Jin

  Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.

• Park J

  Yonsei Univ. Seoul Kor

• Park Jin

  R&d Division Lg Semicon. Co. Ltd.

• Byun J

  Process Team R&d Division Lg Semicon.co.ltd.

• Sohn D

  Strategic Marheting. Applied Materials Korea

• Sohn Dong

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• Sohn Dong

  R&d Division Lg Semicon. Co. Ltd.

• Lee Byung

  Process Development Department 3 Memory R&d Division Hyundai Electronics Co. Ltd.

• Park Jaehyuk

  Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology

• Park J

  Hyundai Microelectronics Co. Ltd. Chungju Kor

• Byun Jeong

  Ulsi Laboratory Of Lg Semicon Co. Ltd.

• PARK Ji-Soo

  Process Development Department 3, Memory R&D Division, Hyundai Electronics Co. Ltd.

• Byun Jeong

  Process Team, R&D Division, LG Semicon.Co.Ltd.,

• Kim Jae

  Process Team, R&D Division, LG Semicon.Co.Ltd.,

• SOHN Dong-Kyun

  Process Gr., Adv. Tech. Lab., LG Semicon. Co. Ltd.

• Kim Jac

  Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U

• Byun Jeong

  Process Team R&d Division Lg Semicon.co.ltd.

• Sohn D

  Applied Materials Korea Chungnam Kor

もっと見る 閉じる

著作論文

• Formation of Low-Resistivity Gate Electrode Suitable for the Future Devices Using Clustered DCS-Wsix Polycide

スポンサーリンク