Micropatterning of SrBi_2Ta_2O_9 Ferroelectric Thin Films Using a Selective Deposition Technique Combined with Patterned Self-Assembled Monolayers and Liquid-Source Misted Chemical Deposition

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-04-15

著者

• SHIMODA Tatsuya

  Technology Platform Research Center, Seiko Epson Cooperation

• ISHIDA Masaya

  Technology Platform Research Center, SEIKO EPSON Corporation

• TAKAKUWA Atsushi

  Technology Platform Research Center, SEIKO EPSON Corporation

• Takakuwa Atsushi

  Technology Platform Research Center Seiko Epson Corporation

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• Micropatterning of SrBi2Ta2O9 Ferroelectric Thin Films Using a Selective Deposition Technique Combined with Patterned Self-Assembled Monolayers and Liquid-Source Misted Chemical Deposition

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