Polyimide Film Micromachining by Wet-Etching Technology
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概要
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We have presented the characteristics of polyimide (PI) film wet-etching using the commercially available and most commonly used Kapton Upilex PI-film as the testing materials and a strong alkaline solution named TPE3000 (from Toray Engineering Co., Ltd., Japan) as the etchant. We have introduced the fabrication process of micro through-holes on the PI-film by wet-etching using two types of etching-mask materials, i.e. a photosensitive dry film and thin copper film. We have also developed thermal-type micro sensor device using densely arrayed micro heaters as the sensing elements. The sensing elements were resistors made of sputtered 200-nm-thick platinum film on the thin (50-μm-thick) flexible PI-film substrate. The electrical feed-through was arranged on the different sides of the substrate and interconnected to the micro heater elements via the wet-etched through-holes, inside walls of which were deposited with thin metal film by means of the electroless copper plating technology. The fabricated device was robust, flexible and can be attached to non-flat curved surface.
- 社団法人 電気学会の論文
- 2005-01-01
著者
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Sato K.
Department of Physics, Graduate School of Science, Tohoku University
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Han J‐s
Department Of Micro System Engineering Nagoya University
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Tan Zhi-yong
Department Of Micro System Engineering Nagoya University
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Han Ji-song
Department Of Micro System Engineering Nagoya University
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SHIKIDA M.
Department of Micro System Engineering, Nagoya University
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Sato K.
Department Of Applied Physics Tokyo University Of Agriculture And Technology
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Shikida M.
Department Of Micro System Engineering Nagoya University
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Sato Kazuo
Department Of Mechanical Engineering Ii Shibaura Institute Of Technology
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Sato Kazuo
Department of Chemistry, Faculty of Science, Yamagata University
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