Forty-Five Degree Micromirror Fabrication Using Silicon Anisotropic Etching with Surfactant-Added Tetramethylammonium Hydroxide Solution
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概要
- 論文の詳細を見る
Flat and smooth 45° micromirrors were successfully fabricated on a 4-in. silicon wafer by means of wet anisotropic etching at the industrially practical temperature of 80 °C using tetramethylammonium hydroxide (TMAH) solution with added NCW-1002, a nonionic surfactant with little environmental load. The effects of the TMAH concentration and the amount of NCW-1002 added were extensively investigated, and it was found that a high TMAH concentration (25 wt %) and a very low amount of NCW-1002, approximately 10 vol ppm, are the optimum conditions to fabricate optically smooth and geometrically flat micromirrors. The mechanism underlying the effects of the concentration of the surfactant is discussed in relation to the clouding point of the surfactant-added TMAH solution.
- 2010-09-25
著者
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Sato Kazuo
Department Of Mechanical Engineering Ii Shibaura Institute Of Technology
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Nishimura Makoto
New Product Technologies Development Department, Panasonic Electric Works Co., Ltd., Kadoma, Osaka 571-8686, Japan
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Yagyu Hiroyuki
New Product Technologies Development Department, Panasonic Electric Works Co., Ltd., Kadoma, Osaka 571-8686, Japan
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Yamaji Tadahiro
New Product Technologies Development Department, Panasonic Electric Works Co., Ltd., Kadoma, Osaka 571-8686, Japan
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Sato Kazuo
Department of Micro/Nano Systems Engineering, Nagoya University, Nagoya 464-8603, Japan
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Sato Kazuo
Department of Chemistry, Faculty of Science, Yamagata University
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