A Modified Capacitance-Voltage Method Used for L_<eff> Extraction and Process Monitoring in Advanced 0.15μm Complementary Metal-Oxide-Semiconductor Technology and Beyond

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A Modified Capacitance–Voltage Method Used for $L_{\text{eff}}$ Extraction and Process Monitoring in Advanced 0.15 $\mu$m Complementary Metal-Oxide-Semiconductor Technology and Beyond

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