Behavior of Nano-N-Channel Metal-Oxide-Semiconductor Off-State Leakage Currents

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-02-15

著者

• YAO Y.

  Institute of Physics, Academia Sinica

• Chen J.

  Centre for Display Research & Department of Electrical and Electronic Engineering, The Hong Kong Uni

• HUANG Heng-Sheng

  Institute of Mechatronics Engineering, National Taipei Universityof Technology

• Yao Y.

  Institute Of Physics Academia Sinica

• Chen J.

  Central Research/development United Microelectronics Corporation

• TUAN Fu-Yuan

  Institute of Manufacturing Technology, National Taipei University of Technology

• HSU Wen-Liang

  Institute of Automation Technology, National Taipei University of Technology

• FNAG Mason

  Customer Integration Engineering, United Microelectronics Corporation

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