Reactive Diffusion between Ultra High Purity Iron and Silicon Wafer
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2001-04-20
著者
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下崎 敏唯
九州工業大学機器分析センター
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Lee Chan-gyu
Department Of Materials Science And Engineering Faculty Of Engineering Changwon National University
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Hirai Akira
Department Of Internal Medicine Chiba Municipal Hospital
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SHIMOZAKI Toshitada
The Center for Instrumental Analysis, Kyushu Institute of Technology
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Lee C‐g
National Inst. Materials Sci. Tsukuba Jpn
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Okino T
College Of Liberal Arts And Sciences Nippon Bunri University
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Okino Takahisa
College Of Liberal Arts & Sciences Nippon Bunri University
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Hirai Akira
Departent Of Materials Science And Engineering Faculty Of Engineering Kyushu Institute Of Technology
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