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Semiconductor Research Center Matsushita Electric Industrial Co. Ltd. | 論文
- Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher : Etching and Deposition Technology
- Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher
- C-V and I-V Characteristics of a MOSFET with Si-Implanted Gate-SiO_2
- A Holographic Optical Element for an Integrated Optical Head
- A Very Small Holographic Optical Pick-up Head with a Movable Single-Assembly Optical System : Head Technology
- A Very Small Holographic Optical Pick-up Head with a Movable Single-Assembly Optical System
- Integrated Holographic Optical Pickup Head with Wide Allowance Range : COMPONENTS
- A 10 Bit All-Parallel A/D Converter : A-4: LSI-3 AND JUNCTION DEVICES
- Atomic-Order Planarization of Ultrathin SiO_2/Si(001) Interfaces
- Doping of Trench Side-Walls Using an Arsenic Planar-Type Solid-Diffusion Source (S-D Source) and Analysis of Doping Uniformity by Secondary Ion Mass Spectroscoty (SIMS)
- A 10b 300MHz Interpolated-Parallel A/D Converter (Special Section on the 1992 VLSI Circuits Symposium)
- Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
- RIE-Lag Reduction by NH_3 Addition in Aluminum Alloy Etching under BCl_3/Cl_2 Chemistry
- Lissajous Electron Plasma (LEP) Generation for Dry Etching
- Novel Porous Films Having Low Dielectric Constants Synthesized by a Liquid Phase Silylation of Spin-On Glass Sol for Intermetal Dielectrics
- SoC Architecture Synthesis Methodology Based on High-Level IPs(System Level Design)(VLSI Design and CAD Algorithms)
- RF Glow Discharge and Ion Transport : Effects of Applied Frequency, Gas Pressure and Method of Power Coupling
- Scaling of Ion Transport Based on Frequency and Pressure in a Parallel-Plate RF Glow Discharge
- Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope) : Inspection and Testing
- Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope)