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Research Center for Nanodevices and Systems, Hiroshima University | 論文
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
- Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
- Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Optically Interconnected Kohonen Net for Pattern Recognition
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- New RAM-bus Memory System with Interchip Optical Interconnection
- Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
- Medium-Energy Ion Spectroscopy Using Ion Implanter
- An Optimized Silicidation Technique for Source and Drain of FINFET
- {111} Facet Formation during Lateral Solid-Phase Epitaxy of Silicon
- New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
- Bipolar Voltage Pulse Induced Current : A Means for Reliable Extraction of Interface Trap Distribution in Ultrathin Oxides MOS Structures
- Determination of Valence Band Alignment at Ultrathin SiO_2/Si Interfaces by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Valence Band Alignment at Ultra-Thin SiO_2/Si(111) Interfaces as Determined by High-Resolution X-Ray Photoelectron Spectroscopy
- Signal Transmission Characteristics between Si Chips with Air Gap using Si Integrated Dipole Antennas