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NTT Applied electronics laboratories | 論文
- X-Ray Diffraction Curves from Mosaic Crystals at Near-Normal Incidence Angles
- Photoemission and RHEED Studies of Bonding Properties at the CaF_2/GaAs(001) Interface
- Critical Thickness for the Si_Ge_x/Si Heterostructure
- Anisotropic Properties of Superconducting (La_Sr_x)_2 CuO_4 Single-Crystal Thin Films
- Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
- Phase-Change Optical Disks with High Writing Sensitivity Using a-SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- Improvement of Surface Flatness on BiSrCaCuO Film
- Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
- Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
- Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
- Etched Profile of Si by Ion-Bombardment-Enhanced Etching
- Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
- High Performance Optical Disk Storage System : DRIVE TECHNIQUE
- Present Status and Future of Opto-Mechatronics
- Submicron-Scale Tip Fabrication for Magnetic Force Microscopy by Electrolytic Polishing
- Electron-Beam-Induced Current Observation of Misfit Dislocations at Si_Ge_x/Si Interfaces
- Simple Measurement of the Reflectivity of Antireflection-Coated Laser Diode Facets : Waves, Optics and Quantum Electronics
- Improvement in Signal-to-Noise Ratio of a Longitudinally Coupled Cavity Laser by Internal Facet Reflectivity Reduction : COMPONENTS
- Electrical Properties of Boundary between YBa_2Cu_3O_ and Ba_K_xBiO_3 Thin Films
- Ba_K_xBiO_3 Thin Film Preparation by ECR Ion-Beam Oxidation, and Film Properties