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Microelectronics Research Laboratories, NEC Corporation | 論文
- Optimally Stable Electron Cyclotron Resonance Plasma Generation and Essential Points for Compact Plasma Source
- Dependence of Residual Chlorine Amount on Al Grain Size
- After-Corrosion Suppression Using Low-Temperature Al-Si-Cu Etching
- Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
- High Performance (AlAs/n-GaAs Superlattice)/GaAs 2DEGFETs with Stabilized Threshold Voltage
- 3-V Operation Power HBTs for Digital Cellular Phones (Special Issue on Microwave Devices for Mobile Communications)
- Application of AlGaAs/GaAs HBT's to Power Devices for Digital Mobile Radio Communications (Special Issue on Heterostructure Electron Devices)
- Simulated Device Design Optimization to Reduce the Floating Body Effect for Sub-Quarter Micron Fully Depleted SOI-MOSFETs (Special Issue on New Concept Device and Novel Architecture LSIs)
- Electronic and Geometric Structures of Fullerenes and Metallofullerenes
- Fermi Surfaces of Alkali-Metal-Doped C_ Solid
- High-Resolution Transmission Electron Microscopy of AlAs/GaAs Imterfacial Structure in the Projection
- Study of Submicron SrTiO_3 Patterning
- Quarter-Micron Interconnection Technologies for 256-Mbit Dynamic Random Access Memories
- Low-Temperature Etching of 0.2 μm Al Patterns Using a Sio_2 Mask
- Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition
- MOCVD GaAlAs Hetero-Buffer GaAs Low-Noise MESFETs : B-5: GaAs IC
- Time Variation of Plasma Properties in a Pulse-Time-Modulated Electron Cyclotron Resonance Discharge of Chlorine Gas
- Planarized Via-Hole Filling with Molybdenum by Bias Sputtering : Techniques, Instrumentations and Measurement
- Evaluation of Electron Trap Levels in SIMOX Buried Oxide by Transient Photocurrent Spectroscopy
- Characteristic of DC SQUIDs Patterned on Highly Granular Y-Ba-Cu-O Thin Films : Electrical Properties of Condensed Matter