Ohmi Shun-ichiro | Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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概要
- 同名の論文著者
- Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technologyの論文著者
関連著者
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Ohmi Shun-ichiro
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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IWAI Hiroshi
Frontier Research Center, Tokyo Institute of Technology
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TSUTSUI Kazuo
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Tsutsui Kazuo
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Iwai Hiroshi
Frontier Collaborative Research Center Tokyo Institute Of Technology
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Iwai Hiroshi
Tokyo Inst. Of Technol. Yokohama‐shi Jpn
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KURIYAMA Atsushi
Frontier Collaborative Research Center, Tokyo Institute of Technology
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Tsutsui Kazuo
Dept. Of Electronics And Applied Physics Tokyo Institute Of Technology
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SAKAI Tetsushi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Sakai Tetsushi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Taguchi Junichi
Frontier Collaborative Research Center Tokyo Institute Of Technology
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Ishiwara Hiroshi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ohmi Shun-ichiro
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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KIM Yongshik
Interdisciplinary Graduate School of Science & Engineering, Tokyo Institute of Technology
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Nishida Jun-ichi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Yamashita Yoshiro
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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YAMAMOTO Hiroyuki
Frontier Collaborative Research Center, Tokyo Institute of Technology
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Kim Yongshik
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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YAMANAKA Go
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Yamanaka Go
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Yamamoto Hiroyuki
Frontier Collaborative Research Center Tokyo Institute Of Technology
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Ohmi Shun-ichiro
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Ohmi Shun-Ichiro
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72, 4259 Nagatsuta, Midori, Yokohama 226-8502, Japan
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Iwai Hiroshi
Frontier Collaborative Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Yamashita Yoshiro
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72, 4259 Nagatsuta, Midori, Yokohama 226-8502, Japan
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Akhtaruzzaman Md.
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72, 4259 Nagatsuta, Midori, Yokohama 226-8502, Japan
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Ishiwara Hiroshi
Department of Advanced Applied Electronics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Ishiwara Hiroshi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72, 4259 Nagatsuta, Midori, Yokohama 226-8502, Japan
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Ibata Masakazu
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
著作論文
- Space-Charge-Limited Currents in La_2O_3 Thin Films Deposited by E-Beam Evaporation after Low Temperature Dry-Nitrogen Annealing
- Effect of Post-Metallization Annealing on Electrical Characteristics of La_2O_3 Gate Thin Films
- Effects of Post Dielectric Deposition and Post Metallization Annealing Processes on Metal/Dy_2O_3/Si(100) Diode Characteristics
- Characterization of AlON Thin Films Formed by ECR Plasma Oxidation of AlN/Si(100)(High-κ Gate Dielectrics)
- Drain Current Characteristics of Ferroelectric Gate-All-Around Si Nanowire Transistors Based on Drift/Diffusion Transport Theory
- Effect of Post-Metallization Annealing on Electrical Characteristics of La2O3 Gate Thin Films
- Study on Stability of Pentacene-Based Metal–Oxide–Semiconductor Diodes in Air Using Capacitance–Voltage Characteristics