Wang Yun | Ultratech Inc.
スポンサーリンク
概要
関連著者
-
Wang Yun
Ultratech Inc.
-
TALWAR Somit
Ultratech Inc.
-
LIN Tengshing
Ultratech Inc.
-
YAMAMOTO Tomonari
Fujitsu Ltd.
-
KUBO Tomohiro
Fujitsu Ltd.
-
KASE Masataka
Fujitsu Ltd.
-
YAMAMOTO Tomonari
Device Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
KUBO Tomohiro
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
OKABE Ken-ichi
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
SUKEGAWA Takae
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
KASE Masataka
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
MINE Toshiyuki
Central Research Laboratory, Hitachi, Ltd.
-
TORII Kazuyoshi
Central Research Laboratory, Hitachi, Ltd.
-
Yamamoto Tomonari
Device Development Department Advanced Lsi Development Division Fujitsu Ltd.
-
Yamamoto Tomonari
Fujitsu Laboratories Ltd.
-
Torii Kazuyoshi
Central Research Laboratory Hitachi Lid.
-
Mine Toshiyuki
Central Research Laboratory Hitachi Ltd
-
Mine Toshiyuki
Central Research Laboratory Hitachi Ltd.
-
Okabe Ken-ichi
Process Development Department Advanced Lsi Development Division Fujitsu Ltd.
-
Kubo Tomohiro
Process Development Department Advanced Lsi Development Division Fujitsu Ltd.
-
Kase Masataka
Process Development Department Advanced Lsi Development Division Fujitsu Ltd.
-
Sukegawa Takae
Process Development Department Advanced Lsi Development Division Fujitsu Ltd.
-
SHIMA Akio
Central Research Laboratory, Hitachi, Ltd.
-
FENG Lucia
Ultratech Inc.
-
WANG Xiaoru
Ultratech Inc.
-
Shima Akio
Central Research Laboratory Hitachi Ltd.
-
Okabe Ken-ichi
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd., Akiruno Technology Center, 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
-
Yamamoto Tomonari
Device Development Department, Advanced LSI Development Division, FUJITSU Ltd., Akiruno Technology Center, 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
-
Kubo Tomohiro
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd., Akiruno Technology Center, 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
-
Wang Yun
Ultratech Inc., San Jose, California 95134, USA
-
Kase Masataka
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd., Akiruno Technology Center, 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
-
Sukegawa Takae
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd., Akiruno Technology Center, 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
-
Lin Tengshing
Ultratech Inc., San Jose, California 95134, USA
著作論文
- Realization of Low CoSi_2/p^+-Silicon Contact Resistance with Low Junction Leakage Current and Junction Capacitance Using Laser Thermal Process
- Suppression of Gate Depletion in p^+-Polysilicon-Gated Sub-40nm pMOSFETs by Laser Thermal Processing
- A Novel Laser Annealing Process for Advanced CMOS with Suppressed Gate Depletion and Ultra-shallow Junctions
- Suppression of Gate Depletion in p+-Polysilicon-Gated Sub-40 nm pMOSFETs by Laser Thermal Processing