Shima Akio | Central Research Laboratory Hitachi Ltd.

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概要

• SHIMA Akioの詳細を見る
• 同名の論文著者
• Central Research Laboratory Hitachi Ltd.の論文著者

関連著者

• Shima Akio

  Central Research Laboratory Hitachi Ltd.

• Torii Kazuyoshi

  Central Research Laboratory Hitachi Lid.

• Mine Toshiyuki

  Central Research Laboratory Hitachi Ltd

• Wang Yun

  Ultratech Inc.

• MINE Toshiyuki

  Central Research Laboratory, Hitachi, Ltd.

• TORII Kazuyoshi

  Central Research Laboratory, Hitachi, Ltd.

• Takeda Ken-ichi

  Central Research Laboratory Hitachi Ltd.

• Sugii Nobuyuki

  Central Research Laboratory Hitachi Ltd.

• Mine Toshiyuki

  Central Research Laboratory Hitachi Ltd.

• Hisamoto Digh

  Central Research Laboratory Hitachi Ltd.

• Tsuchiya Ryuta

  Central Research Laboratory Hitachi Ltd.

• SHIMA Akio

  Central Research Laboratory, Hitachi, Ltd.

• FENG Lucia

  Ultratech Inc.

• WANG Xiaoru

  Ultratech Inc.

• Shima Akio

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Tsuchiya Ryuta

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Takeda Ken-ichi

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Mine Toshiyuki

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Mise Nobuyuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Takeda Kenichi

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Mori Yuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Yamada Ren-ichi

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

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著作論文

• A Novel Laser Annealing Process for Advanced CMOS with Suppressed Gate Depletion and Ultra-shallow Junctions
• Metal Schottky Source/Drain Technology for Ultrathin Silicon-on-Thin-Box Metal Oxide Semiconductor Field Effect Transistors
• Effects of Thin Film Interference on Junction Activation during Sub-Millisecond Annealing
• Novel Laser Annealing Process for Advanced Complementary Metal Oxide Semiconductor Devices with Suppressed Polycrystalline Silicon Gate Depletion and Ultra shallow Junctions
• Experimental Evidence for Involvement of Interface States in Random Telegraph Noise in Junction Leakage Current of MetalOxideSemiconductor Field-Effect Transistor

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