Takeda Ken-ichi | Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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概要
- Takeda Ken-ichiの詳細を見る
- 同名の論文著者
- Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japanの論文著者
関連著者
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Takeda Ken-ichi
Central Research Laboratory Hitachi Ltd.
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Takeda Ken-ichi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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武田 健一
日立製作所 中央研究所
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河江 達也
九州大工
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Takeda Kazuyuki
Department Of Chemistry Graduate School Of Science Kyoto University:(present Address)division Of Adv
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Sugii Nobuyuki
Central Research Laboratory Hitachi Ltd.
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Torii Kazuyoshi
Central Research Laboratory Hitachi Lid.
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Hisamoto Digh
Central Research Laboratory Hitachi Ltd.
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Shima Akio
Central Research Laboratory Hitachi Ltd.
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Takeda Ken'ichi
Central Research Laboratory Hitachi Ltd.
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Tonomura Osamu
Central Research Laboratory Hitachi Ltd.
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Miki Hiroshi
Central Research Laboratory Hitachi Limited
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashikoigakubo Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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Tonomura Osamu
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Mise Nobuyuki
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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河江 連也
九大工
著作論文
- Metal Schottky Source/Drain Technology for Ultrathin Silicon-on-Thin-Box Metal Oxide Semiconductor Field Effect Transistors
- Suppression of Leakage Current of Metal--Insulator--Semiconductor Ta2O5 Capacitors with Al2O3/SiON Buffer Layer