SUKEGAWA Takae | Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
スポンサーリンク
概要
関連著者
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Wang Yun
Ultratech Inc.
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TALWAR Somit
Ultratech Inc.
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YAMAMOTO Tomonari
Device Development Department, Advanced LSI Development Division, FUJITSU Ltd.
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KUBO Tomohiro
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
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OKABE Ken-ichi
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
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SUKEGAWA Takae
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
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LIN Tengshing
Ultratech Inc.
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KASE Masataka
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
著作論文
- Suppression of Gate Depletion in p^+-Polysilicon-Gated Sub-40nm pMOSFETs by Laser Thermal Processing