KUBO Tomohiro | Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
スポンサーリンク
概要
関連著者
-
Wang Yun
Ultratech Inc.
-
TALWAR Somit
Ultratech Inc.
-
YAMAMOTO Tomonari
Device Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
KUBO Tomohiro
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
OKABE Ken-ichi
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
SUKEGAWA Takae
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
-
LIN Tengshing
Ultratech Inc.
-
KASE Masataka
Process Development Department, Advanced LSI Development Division, FUJITSU Ltd.
著作論文
- Suppression of Gate Depletion in p^+-Polysilicon-Gated Sub-40nm pMOSFETs by Laser Thermal Processing