Omura Yasuhisa | High-technology Research Center And Faculty Of Engineering Kansai University
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概要
- OMURA Yasuhisaの詳細を見る
- 同名の論文著者
- High-technology Research Center And Faculty Of Engineering Kansai Universityの論文著者
関連著者
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Omura Yasuhisa
High-technology Research Center And Faculty Of Engineering Kansai University
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Omura Yasuhisa
High-technology Research Center
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Omura Y
Ntt Lsi Laboratories
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Omura Yasuhisa
Electronics Department Kansai University
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Omura Y
Electronics High-technology Research Center And Faculty Of Engineering Kansai University
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Omura Yasuhisa
High-technology Research Center Kansai University
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Nakajima Hidehiko
High-Technology Research Center and Faculty of Engineering, Kansai University
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Kawamura Akira
High-Technology Research Center and Faculty of Engineering, Kansai University
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Komiya Kenji
High-Technology Research Center and Faculty of Engineering, Kansai University
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Kuribayashi Hiroki
Corporate R&d Laboratories Pioneer Corporation
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Nakatsuji Hiroshi
High-technology Research Center And Department Of Electronics Faculty Of Engineering Kansai Universi
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Kawamura Akira
High-technology Research Center And Faculty Of Engineering Kansai University
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Komiya Kenji
High-technology Research Center
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Tamura Susumu
High-technology Research Center And Faculty Of Engineering Kansai University
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Sumino Daijiro
High-technology Research Center
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Nakahara Sumio
High-technology Research Center And Faculty Of Engineering Kansai University
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Omura Yasuhisa
Department Of Electronics Kansai University
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KOBAYASHI Hideki
High-Technology Research Center and Faculty of Engineering, Kansai University
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IIDA Yukio
High-Technology Research Center and Faculty of Engineering, Kansai University
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Iida Y
High-technology Research Center And Faculty Of Engineering Kansai University
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YANAGI Shin-ichiro
High-Technology Research Center and Faculty of Engineering, Kansai University
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NAKAKUBO Atsushi
High-Technology Research Center and Faculty of Engineering, Kansai University
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Nakajima Hidehiko
High-technology Research Center And Faculty Of Engineering Kansai University
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Nakakubo A
Electronics High-technology Research Center And Faculty Of Engineering Kansai University
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Yanagi S
Kansai Univ.
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Yanagi Shin-ichiro
High-technology Research Center
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Kobayashi H
Institute Of Scientific And Industrial Research Osaka University:crest Japan Science And Technology
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中辻 博
京都大学大学院工学研究科
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Omura Y
Kansai Univ. Osaka Jpn
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Masaoka Akira
High-Technology Research Center, Kansai University
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Sumino Daijiro
High-Technology Research Center, Kansai University
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Ishiyama Toshihiko
Ntt Telecommunications Energy Laboratories
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Komiya Kenji
High-technology Research Center And Faculty Of Engineering Kansai University
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Masaoka Akira
High-technology Research Center Kansai University
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Sumino Daijiro
High-technology Research Center Kansai University
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Sumino Daijiro
High-technology Research Center And Faculty Of Engineering Kansai University
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清水 明
Center For Atmospheric And Oceanic Studies Graduate School Of Science Tohoku University
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SHIMIZU Akira
High-Technology Research Center and Department of Electronics, Faculty of Engineering, Kansai Univer
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Nakakubo Atsushi
Electronics, High-Technology Research Center and Faculty of Engineering, Kansai University
著作論文
- Simulation Models for Silicon-on Insulator Tunneling-Barrie-Junction Metal-Oxide-Semiconductor Field-Effect Transistor and Performance Perspective
- Simulation Models for Silicon-on-Insulator Tunneling-Barrier-Junction Metal-Oxide-Semiconductor Field-Effect Transistor and Performance Perspective
- Theory of carrier-density-fluctuation-induced transport noise in metal-oxide-semiconductor field-effect transistors
- Single-Mode Silicon Optical Switch with T-Shaped SiO_2 Optical Waveguide as a Control Gate
- Study on Silicon Optical Switch with T-Shape SiO_2 Waveguide as an Optical Control Gate
- An Improved Theory for Direct-Tunneling Current Characterization in a Metal-Oxide-Semiconductor System with Nanometer-Thick Silicon Dioxide Film
- Quantum Mechanical Influence on Flat-Band Capacitance in Metal-Oxide-Semiconductor Structures with a Nanometer-Thick Silicon Oxide Film and the Impact of Oxide Charge Evaluation
- Effect of Silicon Addtion on Electrical Properties of SrBi2Ta2O9 Thin Films
- Effect of Silicon Addition on Electrical Properties of SrBi_2Ta_2O_9 Thin Films
- A Partial-Ground-Plane (PGP) Silicon-on-Insulator (SOI) Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) for Deep Sub-0.1μm Channel Regime
- Proposal of a Partial-Ground-Plane(PGP) Silicon-on-Insulator(SOI) MOSFET for Deep Sub-100-nm Channel Regime
- Analysis of Interface Microstructure Evolution in Separation by IMplanted OXygen(SIMOX)Wafers
- Significant Impact of Transport Noise Enhancement in Scaled-Down MOSFET's