Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• 白 基鎬

  Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.

• Baik K‐h

  Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor

• Kim H‐s

  Sung Kyun Kwan Univ. Suwon Kor

• Kim H‐s

  Hynix Semiconductor Inc. Kyoungki‐do Kor

• Baik Ki-ho

  Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.

• Jung J‐c

  Hyundai Electronics Ind. Co. Ltd. Kyoungki‐do Kor

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• Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer

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