Optical Lithography for Sub-100nm Technology
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概要
- 論文の詳細を見る
Optical lithography has driven by the miniaturisation of semiconductor devices and has been accompanied by an increase in wafer productivity and performance through the reduction of the IC image geometries. In the last three decades, DRAMs (Dynamic Random Access Memories) have been quadrupling in level of integration every three-year and even two year in recently. Optical lithography has been thriving thanks to evolution of optics and the other peripheral technology innovation. Optical lithography looks like never ending story for the semiconductors industry. The next century lithography will still be dominated by the optical lithography, such as 157nm and EUV.
- 社団法人電子情報通信学会の論文
- 1999-07-22
著者
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Baik Ki-ho
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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白 基鎬
Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Baik K‐h
Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor
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Baik Ki-ho
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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