Optical Proximity Correction Using Diffused Aerial Image Model

概要

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The simulation model which can be applied to correct optical proximity effect has to accurately predict the CD's for various patterns in shape and size within an acceptable computational time budget and with an easiness to calibrate parameters from experimental data. In this respect we compared the simulation results using the DAIM(Diffused Aerial Image Model) with experimental data for three types of patterns (line/space, isolated line and isolated space) with respect to their linearity. We found that DAIM has fine accuracy without any penalty in computational speed and also offers simplicity in analysis. We also found that the mask error effect becomes very significant as the pattern size gets smaller and thus makes the OPC (Optical Proximity Effect Correction) less effective.
社団法人電子情報通信学会の論文
1999-07-22