Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists
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概要
- 論文の詳細を見る
- 1998-12-30
著者
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HAM Young-Mog
Semiconductor Research Div., Hyundai Electronics Industries Co. Ltd.
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BAIK Ki-Ho
Semiconductor Research Div., Hyundai Electronics Industries Co. Ltd.
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LEE Won-Gyu
Inter-university Semiconductor Research Center(ISRC) and School of Electrical Engineering, Seoul Nat
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CHUNG Tack
Institute of Biological and Medical Engineering, Medical Research Center Seoul National University
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CHUN Kukjin
Inter-university Semiconductor Research Center(ISRC) and School of Electrical Engineering, Seoul Nat
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Lee Won-gyu
Inter-university Semiconductor Research Center(isrc) And School Of Electrical Engineering Seoul Nati
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Chung Tack
Institute Of Biological And Medical Engineering Medical Research Center Seoul National University
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Ham Young-mog
Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.
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Ham Young-mog
Semiconductor Research Div. Hyundai Electronics Industries Co.ltd.
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Ham Y‐m
Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor
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Baik Ki-ho
Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Chun Kukjin
Inter-university Semiconductor Research Center(isrc) And School Of Electrical Engineering Seoul Nati
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