Enhanced Light Output of Vertical-Structured GaN-Based Light-Emitting Diode with Surface Roughening Using KrF Laser and ZnO Nanorods
スポンサーリンク
概要
- 論文の詳細を見る
To further improve the performance of vertical-structured GaN-based light-emitting diodes (V-LEDs), surface roughening using a KrF laser and KOH wet chemical etching, followed by hydrothermal growth of vertically aligned ZnO nanorods on top of the n-GaN surface were investigated and discussed. Compared with that of the V-LEDs ($300\times 300$ μm2 in chip size) with only surface KOH wet etching, the formation of curved protrusions and ZnO nanorods on the n-GaN surface typically enables an increase in light output power ($L_{\text{op}}$) by 29% at 20 mA and 41% at 100 mA with a decrease in forward voltage ($V_{\text{f}}$) from 3.24 to 3.06 V at 20 mA and 3.9 to 3.7 V at 100 mA, respectively. The cumulative effect of the curved protrusions, hexagonal cones, and vertically aligned ZnO nanorods formed as a result of effectively reducing the effective thickness of the n-GaN layer, improving the ohmic contact to n-GaN, increasing the surface emission area, and enhancing the escape probability of photons was responsible for these improvements.
- 2010-04-25
著者
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CHEN Tron-Min
Department of Electrical Engineering, Wu-Feng Institute of Technology
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Der-Ming Kuo
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China
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Tron-Min Chen
Department of Electrical Engineering, Wu Feng Institute of Technology, Chia-yi Country 621, Taiwan, Republic of China
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Uang Kai-Ming
Department of Electrical Engineering, WuFeng Institute of Technology, Chia-yi Country 621, Taiwan, Republic of China
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Pei-Ren Wang
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China
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Kai-Ming Uang
Department of Electrical Engineering, Wu Feng Institute of Technology, Chia-yi Country 621, Taiwan, Republic of China
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LEE Wei-Chi
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University
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Po-Hong Wang
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China
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Shui-Jinn Wang
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China
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Shui-Jinn Wang
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1, University Rd., Tainan, Taiwan 701, R.O.C.
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