Absolute Densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an Inductively Coupled Nitrogen Plasma Source
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概要
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The absolute densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an inductively coupled nitrogen plasma source were measured by cavity-ringdown and vacuum–ultraviolet absorption spectroscopies. It was found that the densities of the above three active species were on the same order of $10^{17}$ m-3. We observed the decrease in $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$ density with increasing discharge pressure, while $\text{N}(^{4}S^{\text{o}})$ and $\text{N}(^{2}D^{\text{o}})$ densities increased with discharge pressure. Although the estimation of loss frequency suggested the loss of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$ due to collisional quenching, it was difficult to identify the dominant loss process quantitatively on the basis of the absolute densities and relevant reaction rate coefficients.
- 2010-02-25
著者
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Kurihara Kazuaki
Research And Development Center Toshiba Corporation
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Sasaki Koichi
Plasma Nanotechnology Research Center Nagoya University
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Kazuaki Kurihara
Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Horikawa Yoshimine
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Yoshimine Horikawa
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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