Kurihara Kazuaki | Research And Development Center Toshiba Corporation

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概要

• 同名の論文著者
• Research And Development Center Toshiba Corporationの論文著者

関連著者

• Kurihara Kazuaki

  Research And Development Center Toshiba Corporation

• Sasaki Koichi

  Division Of Quantum Science And Engineering Faculty Of Engineering Hokkaido University

• Horikawa Yoshimine

  Division Of Quantum Science And Engineering Graduate School Of Engineering Hokkaido University

• SASAKI Koichi

  Division of Quantum Science and Engineering, Faculty of Engineering, Hokkaido University

• Kurihara Kazuaki

  Research and Development Center, Toshiba Corporation

• Kurihara Kazuaki

  Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan

• Sekine Makoto

  Microelectronics Lab.toshiba Corporation

• Sasaki Koichi

  Plasma Nanotechnology Research Center Nagoya University

• Sekine Makoto

  Microelectronics Engineering Lab. Toshiba Corporation

• Kazuaki Kurihara

  Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan

• Horikawa Yoshimine

  Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan

• Sasaki Koichi

  Division of Quantum Science and Engineering, Faculty of Engineering, Hokkaido University, Sapporo 060-8628, Japan

• Zaima Kazunori

  Department of Quantum Science and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan

• Yoshimine Horikawa

  Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan

• Horikawa Yoshimine

  Division of Quantum Science and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan

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著作論文

• Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
• Fabrication of Capillary Plate with Sub-Micron Holes for Investigating High-Aspect-Ratio Etching Characteristics
• Effective species in inductively coupled nitrogen plasma for silicon nitriding
• Absolute Densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an Inductively Coupled Nitrogen Plasma Source
• Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
• Evaluation of Absolute Flux of Vacuum Ultraviolet Photons in an Electron Cyclotron Resonance Hydrogen Plasma: Comparison with Ion Flux

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