Sasaki Koichi | Plasma Nanotechnology Research Center Nagoya University
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概要
関連著者
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Sasaki Koichi
Plasma Nanotechnology Research Center Nagoya University
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Takada Noriharu
Department Of Electrical Engineering And Computer Science Nagoya University
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SASAKI Koichi
Plasma Nanotechnology Research Center, Nagoya University
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Takada Noriharu
Department Of Electrical Engineering Nagoya University
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SOLIMAN Wafaa
Department of Electrical Engineering and Computer Science, Nagoya University
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Soliman Wafaa
Department Of Electrical Engineering And Computer Science Nagoya University
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Fukaya Kota
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Sasaki Koichi
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Aoki Satoshi
Tokyo Inst. Technol. Tokyo Jpn
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Yasuda Shin
Department Of Bioscience School Of Agriculture Tokai University
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AOKI Satoshi
Plasma Nanotechnology Research Center, Nagoya University
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NAFARIZAL Nayan
Department of Electrical Engineering and Computer Science, Nagoya University
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SHIBAGAKI Kanji
Department of Electrical and Electronic Engineering, Suzuka National College of Technology
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Kurihara Kazuaki
Research And Development Center Toshiba Corporation
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NAKANO Tetsutaro
Department of Electrical Engineering and Computer Science, Nagoya University
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Nakano Tetsutaro
Department Of Electrical Engineering And Computer Science Nagoya University
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Tabata Akimori
Department Of Electrical Engineering Nagoya University
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Kazuaki Kurihara
Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Horikawa Yoshimine
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Takizawa Kazuki
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Tabata Akimori
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Miwa Kazuhiro
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Usami Kenji
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Yoshimine Horikawa
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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YASUDA Shin
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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HAYASHI Daiyu
Philips Technology Research Laboratories, Weisshausstr. 2, 52066 Aachen, Germany
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ASAKAWA Renge
Department of Electrical and Electronic Engineering, Suzuka National College of Technology, Suzuka, Mie 510-0294, Japan
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TAKADA Noriharu
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
著作論文
- Temporal Variation of Two-Dimensional Temperature in a Laser-Ablation Plume Produced from a Graphite Target
- Growth Processes of Nanoparticles in Liquid-Phase Laser Ablation Studied by Laser-Light Scattering
- Effect of Pressurization on the Dynamics of a Cavitation Bubble Induced by Liquid-Phase Laser Ablation
- Temporal and Spatial Variations in Electron Density and Blackbody Temperature in the Initial Phase of a Laser Ablation BN Plasma
- Dramatic Enhancement of OH(A2Σ+) Density in a Recombining Hydrogen Plasma
- Absolute Densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an Inductively Coupled Nitrogen Plasma Source
- Modification of Fluorinated Al2O3 Surface by Irradiating H2 and O2 Plasmas
- Enhancement of Crystal Growth in Si Thin-Film Deposition by H-Radical-Assisted Magnetron Sputtering
- Investigations of Production Processes of Ti+ in High-Pressure Magnetron Sputtering Plasmas
- Mechanism of Hydrogenated Microcrystalline Si Film Deposition by Magnetron Sputtering Employing a Si Target and H2/Ar Gas Mixture
- Experimental Study of Stark Effects in Argon High Rydberg States