Modification of Fluorinated Al2O3 Surface by Irradiating H2 and O2 Plasmas
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概要
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We irradiated H2 and O2 plasmas onto fluorinated Al2O3, which was prepared by exposing a virgin Al2O3 sample to an SF6/O2 plasma. The effects of the H2 plasma irradiation were the reduction of the AlOxFy ($x + y = 1.5$) and AlFx ($x < 3$) bonding components and the realization of smooth sample surface. It was observed that the irradiation of the H2 plasma induced Al–OH bonding. The Al–OH bonding was removed by the sequential irradiation of the O2 plasma after the H2 plasma irradiation. The O2 plasma irradiation also resulted in peroxidation and an increase in surface roughness.
- 2009-12-25
著者
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Sasaki Koichi
Plasma Nanotechnology Research Center Nagoya University
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Takada Noriharu
Department Of Electrical Engineering And Computer Science Nagoya University
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Sasaki Koichi
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan
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Miwa Kazuhiro
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Usami Kenji
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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