Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding

スポンサーリンク

概要

• 論文の詳細を見る

• We examined effective species in an inductively coupled nitrogen plasma for the nitriding of a silicon surface. We compared the fluxes of active species [N(4), N(2), N₂($A^{3}\Sigma_{\text{u}}^{+}$), and N₂+] with the thickness of the SiO_xN_y layer formed on a silicon substrate. As a result, we concluded that the effective species in silicon nitriding are N₂($A^{3}\Sigma_{\text{u}}^{+}$) and N₂+, when the kinetic energy of N₂+ is less than 10 eV.

• 2011-08-25

著者

• Kurihara Kazuaki

  Research And Development Center Toshiba Corporation

• Horikawa Yoshimine

  Division Of Quantum Science And Engineering Graduate School Of Engineering Hokkaido University

• Sasaki Koichi

  Division Of Quantum Science And Engineering Faculty Of Engineering Hokkaido University

• Kurihara Kazuaki

  Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan

• Horikawa Yoshimine

  Division of Quantum Science and Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan

関連論文

• Estimations of Electron Temperature and Electron Density in Argon-Containing Reactive Plasma Based on Diode Laser Absorption Spectroscopy
• Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
• Fabrication of Capillary Plate with Sub-Micron Holes for Investigating High-Aspect-Ratio Etching Characteristics
• Effective species in inductively coupled nitrogen plasma for silicon nitriding
• Absolute Densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an Inductively Coupled Nitrogen Plasma Source
• Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
• Control of Plasma and Cavitation Bubble in Liquid-Phase Laser Ablation Using Supersonic Waves
• Modification of Rayleigh–Plesset Theory for Reproducing Dynamics of Cavitation Bubbles in Liquid-Phase Laser Ablation
• Evaluation of Absolute Flux of Vacuum Ultraviolet Photons in an Electron Cyclotron Resonance Hydrogen Plasma: Comparison with Ion Flux
• Removal of Water Pollutants by Pulsed Discharge Plasma and Observation of Its Optical Emission Intensity at Atmospheric Pressure
• Effect of Water Pressure on Size of Nanoparticles in Liquid-Phase Laser Ablation
• A Simple Method for Efficient Generation of Standing Cavitation Bubbles
• Removal of Water Pollutants by Pulsed Discharge Plasma and Observation of Its Optical Emission Intensity at Atmospheric Pressure (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

もっと見る 閉じる

スポンサーリンク