Effective species in inductively coupled nitrogen plasma for silicon nitriding
スポンサーリンク
概要
著者
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Kurihara Kazuaki
Research And Development Center Toshiba Corporation
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Horikawa Yoshimine
Division Of Quantum Science And Engineering Graduate School Of Engineering Hokkaido University
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SASAKI Koichi
Division of Quantum Science and Engineering, Faculty of Engineering, Hokkaido University
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Sasaki Koichi
Division Of Quantum Science And Engineering Faculty Of Engineering Hokkaido University
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Kurihara Kazuaki
Research and Development Center, Toshiba Corporation
関連論文
- Estimations of Electron Temperature and Electron Density in Argon-Containing Reactive Plasma Based on Diode Laser Absorption Spectroscopy
- Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
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- Effective species in inductively coupled nitrogen plasma for silicon nitriding
- Absolute Densities of $\text{N$_{2}$}(A^{3}\Sigma_{\text{u}}^{+})$, $\text{N}(^{4}S^{\text{o}})$, and $\text{N}(^{2}D^{\text{o}})$ in an Inductively Coupled Nitrogen Plasma Source
- Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding
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