Fabrication of Capillary Plate with Sub-Micron Holes for Investigating High-Aspect-Ratio Etching Characteristics

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概要

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• We fabricated a real size capillary(RSC)plate with square holes with sides of about 0.8μm, using a silicon-on-insulator wafer, for investigating the etching characteristics of high-aspect-ratio holes. The aspect ratio of the holes was 12.3. The RSC plate was placed on a powered electrode to measure energy distributions of ions passing through the holes in an octafluoro-cyclobutane plasma. We successfully measured the ion energy distributions composed of two major peaks, of nearly the same shape as those observed using a capillary plate with a hole diameter of 10 μm.

• 社団法人応用物理学会の論文
• 2000-03-15

著者

• Kurihara Kazuaki

  Research And Development Center Toshiba Corporation

• Sekine Makoto

  Microelectronics Lab.toshiba Corporation

• Sekine Makoto

  Microelectronics Engineering Lab. Toshiba Corporation

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