Novel Projection Exposure System Using Gradient-Index Lens Array
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概要
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A novel low-cost projection exposure system for printing rough patterns with a width of approximately 10 μm was proposed and its feasibility was verified. In the novel exposure system, a gradient-index (GRIN) lens array was used as the projection optics. The GRIN lens array projects the same-size erect image of the mask patterns onto the wafers. Therefore, arbitrary patterns on a large mask are replicated on a wafer without using a large projection lens by simply scanning the lens array across the whole mask field. Optical lithography for printing rough patterns with widths of 1–10 μm in large areas is widely applied in fabricating various micro-mechanical components. Since the production volumes are usually small, however, expensive optical lithography systems are not easily adopted for production. The new exposure system will provide new advantages for such lithography applications. When the GRIN lens array was fixed steady, line-and-space (L&S) patterns with a line width of 20 μm were printed in spite of the guaranteed low resolution specification of approximately 80 μm. In addition, up to 2.5 μm L&S patterns were locally resolved. Localized high resolution and the uneven resolution performance mainly depend on the periodical light intensity distribution corresponding to the lens array structure. This intensity distribution was greatly improved by scanning the lens array in the direction of the lens array, and averaging the intensity irregularity. By improving the light intensity distribution to be homogeneous, 10 μm L&S patterns were uniformly printed in the whole exposure area.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-07-25
著者
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Horiuchi Toshiyuki
Tokyo Denki Univ. Tokyo Jpn
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Kobayashi Hiroshi
Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan
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Horiuchi Toshiyuki
Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan
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