Horiuchi Toshiyuki | Tokyo Denki Univ. Tokyo Jpn

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概要

• 同名の論文著者
• Tokyo Denki Univ. Tokyo Jpnの論文著者

関連著者

• Horiuchi Toshiyuki

  Tokyo Denki Univ. Tokyo Jpn

• HORIUCHI Toshiyuki

  Tokyo Denki University

• 堀内 敏行

  東京電機大学工学部

• Horiuchi T

  東京電機大

• Tokuhisa Hiroaki

  Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer

• KAWAMURA Yasuhisa

  Tokyo Denki University

• Aichi Shintaro

  Graduate School Of Engineering Tokyo Denki University

• NARITA Tsuyoshi

  Tokyo Denki University

• MIYAKAWA Tomoki

  Tokyo Denki University

• HOSODA Shinnosuke

  Tokyo Denki University

• Miyakawa Tomoki

  Tokyo Denki University:(present Address)nikon Corporation Ohi Plant

• Hosoda Shinnosuke

  Tokyo Denki University:(present Address)smc Corporation Tsukuba Second Plant

• Yaguchi Hiroshi

  Tokyo Denki University

• AICHI Shintaro

  Graduate School of Engineering, Tokyo Denki University

• Mochida Hiroyuki

  Tokyo Denki University

• Iwasaki Jun‐ya

  Tokyo Denki University

• IWASAKI Jun-ya

  Tokyo Denki University

• OTANI Ayaka

  Tokyo Denki University

• Kobayashi Hiroshi

  Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Toshiyuki Horiuchi

  Tokyo Denki University, 2-2 Kandanishikicho, Chiyoda, Tokyo 101-8457, Japan

• Katayama Masahiro

  Tokyo Denki University, 2-2 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Horiuchi Toshiyuki

  Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Saitou Kenta

  Tokyo Denki University, 2-2 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Ooshima Yuki

  Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Mirumachi Naofumi

  Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Fukasawa Hirotoshi

  Tokyo Denki University, 2-2 Kanda Nishiki-cho, Chiyoda, Tokyo 101-8457, Japan

• Shinichiro Ohtsuka

  Tokyo Denki University, 2-2 Kandanishikicho, Chiyoda, Tokyo 101-8457, Japan

• Ohtsuka Shinichiro

  Tokyo Denki University, 2-2 Kandanishikicho, Chiyoda, Tokyo 101-8457, Japan

• Aichi Shintaro

  Graduate School of Engineering, Tokyo Denki University, 2-2, Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Kawamura Yasuhisa

  Tokyo Denki University, 2-2, Kanda-Nishiki-cho, Chiyoda-ku, Tokyo 101-8457, Japan

• Ono Hiroshi

  Tokyo Denki University, Adachi, Tokyo 120-8551, Japan

• Sasaki Ryosuke

  Tokyo Denki University, Adachi, Tokyo 120-8551, Japan

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著作論文

• Half Wavelength Pattern Replization Using a Projection Lens with an Ultra High Numerical Aperture and Thin Resist Process
• A New Projection Exposure Method Using a Liquid Crystal Display as a Switching Matrix in Place of a Reticle
• Novel Laser Scan Lithography onto Deep Inside Surfaces of Fine Pipes Using a Reflection Rod
• Helical Patterning onto Fine Pipes and Fabrication of Long Microcoils
• New Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
• Curved Resist Surface Fabrication by Scanning a Blue Laser Beam With Positional Dose Distribution : Instrumentation, Measurement, and Fabrication Technology
• Application of Matrix Projection Exposure Using a Liquid Crystal Display Panel to Fabricate Thick Resist Molds
• Optical-Fiber-Matrix Exposure Using Light-Emitting-Diode Sources
• Multi-layer Resist Process Using Top-layer Resist as Phase Shifters
• New-Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
• New Laser-Scan Exposure System for Delineating Precise Helical Patterns onto Sub-50-μmWires (Special Issue : Microprocesses and Nanotechnology)
• Gradation Stitching Exposure for Step-and-Scan Projection Printing System
• Fabrication of Nickel Microlens Dies Using Hemispherical Resist Patterns as Electroplating Molds (Special Issue : Microprocesses and Nanotechnology)
• Direct Writing of Resist Patterns Using a Wire Nozzle Newly Developed for an Air-Pressure Dispenser
• Gradation Stitching Exposure Performance in the Improvement of Dose Uniformity and Continuity at the Field Stitching Boundaries
• Novel Exposure System Using Light-Emitting Diodes and an Optical Fiber Array for Printing Code Marks
• Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle
• Novel Projection Exposure System Using Gradient-Index Lens Array

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