New Laser-Scan Exposure System for Delineating Precise Helical Patterns onto Sub-50-μmWires (Special Issue : Microprocesses and Nanotechnology)
スポンサーリンク
概要
著者
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Horiuchi Toshiyuki
Tokyo Denki Univ. Tokyo Jpn
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Sasaki Ryosuke
Tokyo Denki University, Adachi, Tokyo 120-8551, Japan
関連論文
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- Curved Resist Surface Fabrication by Scanning a Blue Laser Beam With Positional Dose Distribution : Instrumentation, Measurement, and Fabrication Technology
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- Multi-layer Resist Process Using Top-layer Resist as Phase Shifters
- New-Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
- New Laser-Scan Exposure System for Delineating Precise Helical Patterns onto Sub-50-μmWires (Special Issue : Microprocesses and Nanotechnology)
- Gradation Stitching Exposure for Step-and-Scan Projection Printing System
- Fabrication of Nickel Microlens Dies Using Hemispherical Resist Patterns as Electroplating Molds (Special Issue : Microprocesses and Nanotechnology)
- Direct Writing of Resist Patterns Using a Wire Nozzle Newly Developed for an Air-Pressure Dispenser
- Gradation Stitching Exposure Performance in the Improvement of Dose Uniformity and Continuity at the Field Stitching Boundaries
- Novel Exposure System Using Light-Emitting Diodes and an Optical Fiber Array for Printing Code Marks
- Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle
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