Gradation Stitching Exposure for Step-and-Scan Projection Printing System
スポンサーリンク
概要
- 論文の詳細を見る
A new step-and-scan exposure method for enlarging the field size is proposed. The design and fabrication of projection exposure optics with a large field is difficult, especially for short wavelengths, and the exposure field should be kept as small as possible for obtaining high resolution, insuring sufficient depth of focus and decreasing the distortion of the optics. However, developing more advanced devices requires large chips. Thus, field stitching is investigated to resolve this inconsistency. In the new method, by generating gradation at the stitched boundaries and keeping the overlapping length long, the exposure dose continuity becomes very good, and stitching notches do not form. However, intensity distribution degradation, pattern position shift and contrast deterioration, which are dependent on stitching errors, should be taken into consideration to maintain the pattern quality within an acceptable range. Calculations indicate that the stitching errors should be suppressed to below about 0.2u, where u = λ/2NA is comparable to the resolution limit.
- 社団法人応用物理学会の論文
- 1998-12-15
著者
関連論文
- Half Wavelength Pattern Replization Using a Projection Lens with an Ultra High Numerical Aperture and Thin Resist Process
- A New Projection Exposure Method Using a Liquid Crystal Display as a Switching Matrix in Place of a Reticle
- Novel Laser Scan Lithography onto Deep Inside Surfaces of Fine Pipes Using a Reflection Rod
- Helical Patterning onto Fine Pipes and Fabrication of Long Microcoils
- New Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
- Curved Resist Surface Fabrication by Scanning a Blue Laser Beam With Positional Dose Distribution : Instrumentation, Measurement, and Fabrication Technology
- Application of Matrix Projection Exposure Using a Liquid Crystal Display Panel to Fabricate Thick Resist Molds
- Optical-Fiber-Matrix Exposure Using Light-Emitting-Diode Sources
- Multi-layer Resist Process Using Top-layer Resist as Phase Shifters
- New-Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
- New Laser-Scan Exposure System for Delineating Precise Helical Patterns onto Sub-50-μmWires (Special Issue : Microprocesses and Nanotechnology)
- Gradation Stitching Exposure for Step-and-Scan Projection Printing System
- Fabrication of Nickel Microlens Dies Using Hemispherical Resist Patterns as Electroplating Molds (Special Issue : Microprocesses and Nanotechnology)
- Direct Writing of Resist Patterns Using a Wire Nozzle Newly Developed for an Air-Pressure Dispenser
- Gradation Stitching Exposure Performance in the Improvement of Dose Uniformity and Continuity at the Field Stitching Boundaries
- Novel Exposure System Using Light-Emitting Diodes and an Optical Fiber Array for Printing Code Marks
- Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle
- Novel Projection Exposure System Using Gradient-Index Lens Array