Multi-layer Resist Process Using Top-layer Resist as Phase Shifters
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関連論文
- Half Wavelength Pattern Replization Using a Projection Lens with an Ultra High Numerical Aperture and Thin Resist Process
- A New Projection Exposure Method Using a Liquid Crystal Display as a Switching Matrix in Place of a Reticle
- Novel Laser Scan Lithography onto Deep Inside Surfaces of Fine Pipes Using a Reflection Rod
- Helical Patterning onto Fine Pipes and Fabrication of Long Microcoils
- New Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
- Curved Resist Surface Fabrication by Scanning a Blue Laser Beam With Positional Dose Distribution : Instrumentation, Measurement, and Fabrication Technology
- Application of Matrix Projection Exposure Using a Liquid Crystal Display Panel to Fabricate Thick Resist Molds
- Optical-Fiber-Matrix Exposure Using Light-Emitting-Diode Sources
- Multi-layer Resist Process Using Top-layer Resist as Phase Shifters
- New-Projection Exposure Using a Double-line Matrix of Optical Fibers in Place of a Reticle
- New Laser-Scan Exposure System for Delineating Precise Helical Patterns onto Sub-50-μmWires (Special Issue : Microprocesses and Nanotechnology)
- Gradation Stitching Exposure for Step-and-Scan Projection Printing System
- Fabrication of Nickel Microlens Dies Using Hemispherical Resist Patterns as Electroplating Molds (Special Issue : Microprocesses and Nanotechnology)
- Direct Writing of Resist Patterns Using a Wire Nozzle Newly Developed for an Air-Pressure Dispenser
- Gradation Stitching Exposure Performance in the Improvement of Dose Uniformity and Continuity at the Field Stitching Boundaries
- Novel Exposure System Using Light-Emitting Diodes and an Optical Fiber Array for Printing Code Marks
- Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle
- Novel Projection Exposure System Using Gradient-Index Lens Array