Fabrication of Circular-Type Microchannel Using Photoresist Reflow and Isotropic Etching for Microfluidic Devices
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概要
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In this study, we fabricated circular channels using photoresist reflow and isotropic etching. A silicon substrate, using Si3N4 as a mask, was selectively etched using the hydrofluoric acid, nitric acid, acetic acid (HNA) etching system for fabricating the bottom hemisphere of the channels. Photoresist reflow was used to make the top of the channels round. Then Si3N4 was deposited on the reflowed photoresist. Since the deposited Si3N4 was approximately 6000 Å thick, it was possible to observe the inside of the channel. We expect to apply such circular channels to simple bio-systems and microfluidic devices in which optical detection is required.
- 2004-11-15
著者
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EUN Duk-Soo
Department of Electronics, Kyungpook National University
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Bae Chang-hyun
Department Of Electronics Kyungpook National University
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Seo Chang-taeg
Department Of Electronics Kyungpook National University
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Shin Jang-kyoo
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology:school Of Ele
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Lee Jong-hyun
Department Of Electronics Kyungpook National University
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Shin Jang-Kyoo
Department of Electronics, Kyungpook National University, 1370 Sankyuk-dong, Buk-ku, Daegu 702-701, Korea
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Eun Duk-Soo
Department of Electronics, Kyungpook National University, 1370 Sankyuk-dong, Buk-ku, Daegu 702-701, Korea
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Eun Duk-Soo
Department of Electronics, Graduate School, Kyungpook National University, 1370 Sankyuk-dong, Buk-gu, Daegu 702-701, Republic of Korea
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Bae Chang-Hyun
Department of Electronics, Kyungpook National University, 1370 Sankyuk-dong, Buk-ku, Daegu 702-701, Korea
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