Structural Control of Silicon Oxide Particles by Oxygen Partial Pressure in RF Plasma
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概要
- 論文の詳細を見る
Amorphous silicon oxide particles with the size of 30–100 nm were produced by spraying Si(C2H5O)4 liquid into a plasma region. Plasma was generated at a high pressure of 10 Torr in a mixture gas of argon and oxygen. The production of two silicon oxide particles with the structure of SiO and SiO2 could be controlled by the oxygen partial pressure in plasma.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-09-15
著者
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TAKEDA Atsushi
ISI. Ltd.
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Sato Takeshi
Department Of Bioresource Science Faculty Of Agriculture Kagawa University
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Kimura Yuki
Department Of Applied Physics University Of Miyazaki
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Kaito Chihiro
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Suzuki Hitoshi
Department Of Animal Science Faculty Of Agriculture Tohoku University
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Saito Yoshio
Department of Electron and Information Science, Kyoto Institute of Technology, Kyoto 606-8585, Japan
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Saito Yoshio
Department of Electron and Information Science, Kyoto Institute of Technology,
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Takeda Atsushi
ISI. Ltd., Motobuto 5-chome 40-6, Saitama-shi, Saitama 336-0004, Japan
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SAITO Yoshio
Department of Chemistry, Faculty of Science and Technology, Keio Univerisity
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Kaito Chihiro
Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-857, Japan
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