Impact of Air Filter Material on Metal Oxide Semiconductor (MOS) Device Characteristics in HF Vapor Environment
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概要
- 論文の詳細を見る
Airborne molecular contamination (AMC) is becoming increasingly important as devices are scaled down to the nanometer generation. Optimum ultra low penetration air (ULPA) filter technology can eliminate AMC. In a cleanroom, however, the acid vapor generated from the cleaning process may degrade the ULPA filter, releasing AMC to the air and the surface of wafers, degrading the electrical characteristics of devices. This work proposes the new PTFE ULPA filter, which is resistant to acid vapor corrosion, to solve this problem. Experimental results demonstrate that the PTFE ULPA filter can effectively eliminate the AMC and provide a very clean cleanroom environment.
- 2004-05-15
著者
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YEH Ching-Fa
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University
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Lou Jen-chung
Department Of Electrical Engineering National Tsing Hua University
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Hsieh Chih-Ming
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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Lou Jen-Chung
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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Hsiao Chih-Wen
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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Lin Shiuan-Jeng
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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Kusumi Toshio
Daikin Industries, Ltd., 1-1 Nishi Hitotsuya, Settsu, Osaka 566-8585, Japan
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Lin Shiuan-Jeng
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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Yeh Ching-Fa
Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, R.O.C.
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