PECVD法による超はっ水薄膜の作製とその形成過程の観察

概要

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Ultra water-repellent films were prepared by using rf PECVD. Relationships between the rf power and water repellency, morphological and chemical properties were investigated. Moreover, the growth process of ultra water repellent thin films was evaluated by using FESEM. The experimental results showed that surface morphology of the films strongly depends on the rf power, and that increasing the rf power made it possible to from ultra water-repellent films. At the first stage of the growth, the nano-clusters were deposited randomly on the substrate surface. These clusters were originated from a polymerization process in the gas phase and deposited on the substrate. When the film was deposited for several tens of seconds, the nano-clusters showed a tendency to form chains or islands, which means the clusters must have a spatial preference. Finally, these films have particular nano-textures with nano-scale pores of a few hundreds of nanometers in diameter among the rough web-like structure of the nano-cluster agglomerates