光学薄膜における光散乱計測方法の検討

概要

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Higher optical quality is increasingly required for optical thin films in accordance with the advancement of imaging devices. There are few reports on the systematic study of the light scattering characteristics of optical thin films. Currently, it is difficult to control light scattering properties during the deposition process. The wavelength region covered with the optical film becomes wider to the UV region and the light intensity incident upon the film becomes stronger. Light scattering which is the major cause of the decrease in transmission and stray light, is considered an important factor for characterizing the performance of optical thin films. The haze value which is the conventional parameter of light scattering does not posses spectral information. Characterization beyond the visible region is not possible by using the value. In this study, we proposed a spectral haze value which is derived by using a spectrometer and an integral sphere unit. TiO_2 thin films were used as test samples, because the light scattering property of the sample is sensitive to the deposition condition. TiO_2 thin films are deposited on BK7 glass substrates to the thickness of 1 micron by electron beam (EB) deposition and ion assisted deposition (IAD) methods, and the light scattering was characterized by using a spectral haze value for these films.
東海大学の論文