ZnO薄膜光導波路中の光伝搬損失機構および三次元光導波路の試作

概要

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The mechanism of the propagation loss of the thin film optical waveguide and the patterning technique for three dimensional waveguide have been studied in relation with the application of ZnO thin film waveguide to the optical integrated circuit. In investigating propagation loss mechanism, various annealing methods were applide to ZnO films deposited with RF sputtering. The increase or decrease in the propagation loss caused by the annealing was analyzed and a model was proposed to explain the propagation loss mechanism. The dry etching method by KrF excimer laser was proposed for patterning the optical circuit. Fairly good characteristics of etching was obtained for manufacturing three dimensional optical waveguide by the etching method. Light confinement effect within the three dimensional waveguide was found through measurement of the propagation loss.
東海大学の論文