光導波路用スパッタ成膜ZnO薄膜の構造評価と光学的性質

概要

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ZnO thin films are deposited on Corning 7059 substrates by RF magnetron sputtering. The XRD and characterizations SEM are used to estimate the film structures. As the results, highly C-axis oriented films are obtained for the deposition rate of 1∿10 nm/min when the substrate is rotated (12 rpm), for the deposition rate of 12∿24 nm/min when the substrate is held. The optical properties are studied for the wavelengh region of 300∿2500 nm at the temperature of 10∿300 K. The refractive indices for the transparent region of the films are derived from the the interference fringes in the transmission spectra. The packing densities of the films are estimated using the refractive indices of ZnO films and single crystal. Urbach parameters are determined by appling the Urbach rule for the absorption spectrum of RF sputtered ZnO films near the fundamental absorption edge. The propagating attenuation constants are obtained from the measurements of the light scattered out of the palne of ZnO 2D optical waveguide.
東海大学の論文