Gate-Induced Drain Leakage Currents in Metal Oxide Semiconductor Field Effect Transistors with High-κ Dielectric

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-07-15

著者

• Chang Sung-il

  Kaist

• Shin Hyungcheol

  KAIST

• Shin Hyungcheol

  Department Of Electrical Engineering And Computer Science Korea Advanced Institute Of Science And Te

• Shin Hyungcheol

  Department Of Electrical Engineering And Computer Science Kaist

• Lee J

  Wonkwang University

• LEE Jongho

  School of Electrical Engineering, Wonkwang University

• CHANG Sung-il

  Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and T

• Lee Jongho

  School Of Electrical Eng. Wonkwang Univ.

• Chang Sungi-il

  Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and Technology

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