Effect of Ni Doping on Improvement of the Tanability and Dielectric Loss of Ba_<0.5>Sr_<0.5>TiO_3 Thin Films for Microwave Thnable Devices : Electrical Properties of Condonsed Matter

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-11-15

著者

• Yoon Soon-Gil

  Department of Materials Engineering, Chungnam National University

• Jeon Young-ah

  Department Of Materials Engineering Chungnam National University

• Seo Tae-suck

  Department Of Materials Engineering Chungnam National University

• Yoon Soon-gil

  Department Of Materials Engineering Chungnam National University

• Yoon Soon-gil

  Department Of Materials And Engineering Chungnam Notional University

関連論文

• Bottom Electrode Structures of Pt/RuO_2/Ru on Polycrystalline Silicon for Low Temperature (Ba, Sr)TiO_3 Thin Film Deposition
• Ferroelectric Properties of SrBi_2Ta_2O_9 Thin Films Deposited on Various Bottom Electrodes by a Modified Radio-Frequency Magnetron Sputtering Technique
• Effect of Ni Doping on Improvement of the Tanability and Dielectric Loss of Ba_Sr_TiO_3 Thin Films for Microwave Thnable Devices : Electrical Properties of Condonsed Matter
• Phase Formations and Electrical Properties of Bi_La_Ti_3O_ and Sm-Doped Bi_La_Sm_Ti_3O_ Thin Films with Annealing Temperature
• Fabrication and Characterization of Ferroelectric-Gate Memory Devices Using (Bi, La)4Ti3O12/HfO2 Structure (先端デバイスの基礎と応用に関するアジアワークショップ)
• Fabrication and Characterization of Ferroelectric-Gate Memory Devices Using (Bi, La)_4 Ti_3O_/HfO_2 Structure (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
• SrTa_2O_6 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition : Surfaces, Interfaces, and Films
• Growth and Characterization of (Ba_Sr_)TiO_3 Films Epitaxially Grown on (002) GaN/(0006) Al_2O_3 Electrode
• Influence of Narrow Transverse Slit in Ferroelectric Based Voltage Tunable Phase Shifter
• Improvement in Structural and Electrical Properties of (Ba_Sr_)TiO_3 Capacitors Using (Ba_Sr_)RuO_3 Conductive Layers at (Ba_Sr_)TiO_3/Pt Interface
• Effects of Chamber Pressure on Composition and Electrical Properties of Zr-Modified (Ba_ Sr_x)TiO_3 Thin Films Grown by Sputtering
• Characterization of Aluminum Nitride Thin Films on Silicon Substrates Grown by Plasma Assisted Molecular Beam Epitaxy
• Characterization of Pb_ La_x TiO_3 Thin Films by the Radio Frequency Magnetron Sputtering Technique
• Growth and Characterization of (Ba0.5Sr0.5)TiO3 Films Epitaxially Grown on (002) GaN/(0006) Al2O3 Electrode
• Phase Formations and Electrical Properties of Bi3.15La0.85Ti3O12 and Sm-Doped Bi3.073La0.85Sm0.077Ti3O12 Thin Films with Annealing Temperature
• Bismuth-Based Pyrochlore Thin Films Deposited at Low Temperatures for Embedded Capacitor Applications
• Improvement in Structural and Electrical Properties of (Ba0.5Sr0.5)TiO3 Capacitors Using (Ba0.5Sr0.5)RuO3 Conductive Layers at (Ba0.5Sr0.5)TiO3/Pt Interface

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