Comparison of Sorption Process in Titanium and Vanadium Films
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概要
- 論文の詳細を見る
We observed the sorption process of hydrogen atoms beneath titanium and vanadium films using an electrical resistance method, AES and AEAPS. Applying Toya's theory to our measurements of the resistance, we may derive that both r- and s-type adsorption states exist in titanium films, whereas only the r-type state seems to be present in vanadium films. From the results of AES and AEAPS, we may assume that the V-H bond is formed beneath the metal surface as is the Ti-H bond; nanely, the r-type adsorption state in the vanadium films is apparently present beneath the metal surface as well as the s-type adsorption state in the titanium films.
- 社団法人応用物理学会の論文
- 1985-07-20
著者
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Sasakura Hiroshi
Department Of Electrical Engineering And Electronics Faculty Of Engineering Tottori Univeristy
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Sasakura H
Department Of Materials Science University Of Osaka Prefecture
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Konishi R
Tottori Univ. Tottori
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Konishi Ryosuke
Department Of Electrical And Electronic Engineering Tottori University
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MIYADA Yoshinori
Department of Electronics, Faculty of Engineering, Tottori University
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Miyada Yoshinori
Department Of Electronics Faculty Of Engineering Tottori University
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