Stress in NbC_xN_<1-x> Films Prepared by Reactive Rf Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-06-15
著者
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Shoji A
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Shoji Akira
Electrotechnical Laboratory
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Koikegami Shigeru
Jsps:(present Address) Advance Soft And Iis University Of Tokyo
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Koikegami Shigeru
Nanoelectronics Research Institute
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Koike Soh
Institute Of Materials Science University Of Tsukuba:electrotechnical Laboratory
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Koike S
Department Of Physics Ii Science University Of Tokyo
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Kohjiro S
Electrotechnical Lab. Tsukuba Jpn
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Kohjiro Satoshi
Electrotechnical Laboratory
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KIRYU Shogo
Electrotechnical Laboratory
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Kawabata Shiro
Nanotechnology Research Institute Aist
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KODAIRA Shinji
Kisarazu National College of Technology
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Kohjiro S
Electrotechnical Laboratory
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