Solid-Phase Epitaxy with X-Ray Irradiation to Grow Dislocation-Free Silicon Films at Low Temperatures
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-02-01
著者
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GOTO Kenya
Department of Information and Communication Technology Tokai University
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Sato F
Equine Research Institute
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Sato F
Jasco Corp. Tokyo Jpn
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SATO Fumio
NHK Science and Technical Research Laboratories
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GOTO Katsuyuki
NHK Science and Technical Research Laboratories
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CHIKAWA Jun-ichi
Himeji Institute of Technology
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Chikawa Jun-ichi
KEK National Laboratory for High Energy Physics
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Goto K
Department Of Information And Communication Technology Tokai University
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Chikawa J
Himeji Institute Of Technology
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Sato Fumio
Nhk Science & Technical Research Laboratories
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